Patent · US Active

Composition for removing chemical residues and uses thereof

US12286607B2 · kind B2 · utility

0Cited by
0References
16Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 20, 2020
Grant dateApr 29, 2025
Priority date
Expiry dateMar 29, 2042

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC11D2111/20
  • WIPO fieldBasic materials chemistry
  • WIPO sectorChemistry

Abstract

A decontamination composition with at least one primary neutralizing agent and at least one secondary neutralizing agent, for the removal of chemical residues, to a method for employing the composition, and the use of the composition for removing residues on materials, machines, and equipment soiled with chemicals of any type, such as a corrosive product or a chemical containing fluoride ions.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.