Composition for removing chemical residues and uses thereof
US12286607B2 · kind B2 · utility
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16Claims
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Key dates
| Filing date | Feb 20, 2020 |
| Grant date | Apr 29, 2025 |
| Priority date | — |
| Expiry date | Mar 29, 2042 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/20
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A decontamination composition with at least one primary neutralizing agent and at least one secondary neutralizing agent, for the removal of chemical residues, to a method for employing the composition, and the use of the composition for removing residues on materials, machines, and equipment soiled with chemicals of any type, such as a corrosive product or a chemical containing fluoride ions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.