Light-induced aluminum plating on silicon for solar cell metallization
US12286722B2 · kind B2 · utility
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19Claims
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Key dates
| Filing date | Feb 23, 2024 |
| Grant date | Apr 29, 2025 |
| Priority date | — |
| Expiry date | Feb 23, 2044 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10F77/227
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Methods for light-induced electroplating of aluminum are disclosed herein. Exemplary methods may comprise preparing an ionic liquid comprising aluminum chloride (AlCl3) and an organic halide, placing the silicon substrate into the ionic liquid, illuminating the silicon substrate, the illumination passing through the ionic liquid, and depositing aluminum onto the silicon substrate via a light-induced electroplating process, wherein the light-induced electroplating process utilizes an applied current that does not exceed a photo-generated current generated by the illumination.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.