Underlayer compositions and patterning methods

US12287576B2 · kind B2 · utility

Assignee

• DuPont Electronic Materials International, LLC · US

Inventors

• Joshua Kaitz · Watertown, US
• Sheng Liu · Bow, US
• Li Cui · Westborough, US
• Shintaro Yamada · Shrewsbury, US
• James F. Cameron · Brookline, US
• Emad Aqad · Northborough, US
• Iou-Sheng Ke · Andover, US
• Suzanne M. Coley · Mansfield, US

Key dates

• Filing date: Jun 20, 2024
• Grant date: Apr 29, 2025
• Expiry date: Jun 20, 2044

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/094
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

An underlayer composition, comprising a polymer comprising a repeating unit of formula (1): wherein Ar is a monocyclic or polycyclic C5-60 aromatic group, wherein the aromatic group comprises one or more aromatic ring heteroatoms, a substituent group comprising a heteroatom, or a combination thereof; X is C or O; R1, R2; Ra and Rb are as provided herein; optionally, R1 and R2 can be taken together form a 5- to 7-membered ring; optionally, one of R11 to R13 can be taken together with R1 to form a 5- to 7-membered ring; wherein Ra and Rb optionally may be taken together to form a 5- to 7-membered ring; wherein one of Ra or Rb optionally may be taken together with R2 to form a 5- to 7-membered ring; and when X is O, Ra and Rb are absent.