Patent · US Active

Method for removing an impurity from a chlorosilane mixture

US12291458B2 · kind B2 · utility

0Cited by

8References

20Claims

0Family size

Assignee

Wacker Chemie AG · DE

Inventors

Jens Felix Knoth · Munich, DE
Sebastian BOCHMANN · Albernau, DE
Uwe Pätzold · Burghausen, DE
Sebastian Prost · Stilln, DE

Key dates

Filing date	Nov 27, 2019
Grant date	May 6, 2025
Priority date	—
Expiry date	Feb 4, 2041

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB01J20/28083
WIPO fieldChemical engineering
WIPO sectorChemistry

Abstract

Boron, phosphorus, arsenic, antimony and other impurities are at least partially removed from a mixture containing at least one chlorosilane and/or organochlorosilane by where

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.