Image stitching method for stitching product
US12292692B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 25, 2022 |
| Grant date | May 6, 2025 |
| Priority date | — |
| Expiry date | Jan 31, 2044 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10F39/011
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present application discloses an image stitching method for a stitching product, which includes: step 1: providing a chip design layout of the stitching product; step 2: designing a mask layout according to the chip design layout, including: step 21: setting unit mask images; step 22: merging logic images or cutting path images of adjacent areas between unit regions together to set corresponding peripheral mask images; step 23: merging the same peripheral mask images into one; step 24: constituting a mask layer by using the unit mask images and each peripheral mask image, and forming the mask layout on a mask; step 3: performing repeated exposure to form the stitching product. The present application can reduce the number of mask images, the number of times of exposure and the time of exposure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.