Patent · US Active

Method of providing a cleaned gas diffusion layer for electrochemical applications

US12294091B2 · kind B2 · utility

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8Claims
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Assignee

Inventors

Key dates

Filing dateJun 9, 2021
Grant dateMay 6, 2025
Priority date
Expiry dateJul 19, 2042

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02E60/50
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

A method of providing a cleaned gas diffusion layer for electrochemical applications includes providing a gas diffusion layer such that a first side of the gas diffusion layer is arranged on a first vacuum conveyor belt, cleaning an exposed second side of the gas diffusion layer, the second side being situated opposite the first side of the gas diffusion layer, transferring the partially cleaned gas diffusion layer to a second vacuum conveyor belt partially situated opposite the first vacuum conveyor belt, wherein the first vacuum conveyor belt and the second vacuum conveyor belt have a transfer region in which the gas diffusion layer is transferred from the first vacuum conveyor belt to the second vacuum conveyor belt such that the first side of the gas diffusion layer is exposed, and cleaning the first side of the gas diffusion layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.