Method and system for determining the position of an element of an optical system in an assembly for processing or measuring an object, as well as the position of said object relative to said assembly, by parallel interferometric measurements
US12298131B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 4, 2020 |
| Grant date | May 13, 2025 |
| Priority date | — |
| Expiry date | Dec 28, 2041 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P10/25
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and a system for determining relative position of an element of an optical system of an assembly for processing or measuring an object along a measurement line, involve generating a measurement beam and a reference beam of low coherence optical radiation. The measurement and reference beams, alternately or in combination, have a main beam and a multiplexed additional beam. The measurement beam, led toward the element of the optical system, and back-reflected, is superimposed on the reference beam in a region of common incidence of an interferometric optical sensor arrangement. Position or frequency of a main interference fringe pattern and an additional interference fringe pattern is detected.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.