Array substrate, method for manufacturing same, display panel, and display device

US12302724B2 · kind B2 · utility

Assignees

• Ordos Yuansheng Optoelectronics Co., Ltd. · CN
• BOE Technology Group Co., Ltd. · CN

Inventors

• Liang Tang · Sunnyvale, US
• Liangliang LIU · Beijing, CN
• Liman Peng · Beijing, CN
• Yan Wu · Beijing, CN
• Nini Bai · Beijing, CN
• Qiang Chen · Sollentuna, SE
• Xu Liu · Nanhu, CN
• Guodong Jing · Beijing, CN
• Qianqian Zhang · Beijing, CN
• Zhiyong Xue · Beijing, CN
• Qiang Guo · Tangxia, CN
• Guofang Xu · Longmont, US
• Zihua LI · Beijing, CN
• Qiang Wang · Beijing, CN
• Ruiqing Zhang · Xibeiwang, CN
• Xudong Wang · Kirkland, US

Key dates

• Filing date: Mar 9, 2021
• Grant date: May 13, 2025
• Expiry date: May 26, 2042

Classification

• Technology area (CPC H): Electricity
• CPC primary: H10K59/1201

Abstract

Provided is a method for manufacturing an array substrate. The method includes: providing a base substrate with a conductive pattern layer, wherein the base substrate is provided with a display region and a peripheral region disposed around the display region, wherein the conductive pattern layer includes a plurality of conductive lines disposed in the peripheral region; forming an electrode material film layer on the conductive pattern layer; forming a mask layer on the electrode material film layer, wherein the mask layer includes a plurality of electrode layer patterns disposed in the display region and protection patterns disposed above the conductive lines; and etching the electrode material film layer and removing the mask layer.