Method for manufacturing photoelectrode
US12305299B2 · kind B2 · utility
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12Claims
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Key dates
| Filing date | May 12, 2022 |
| Grant date | May 20, 2025 |
| Priority date | — |
| Expiry date | Mar 10, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01M14/005
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present application relates to a method for manufacturing a photoelectrode, the method comprising steps of impregnating a first transition metal oxide capable of performing photoreaction in an electrolyte, applying a voltage onto the electrolyte to generate an electrochemical oxidation reaction on the surface of the first transition metal oxide, and forming a second transition metal oxide thin film on the surface of the first transition metal oxide by irradiating light onto the first transition metal oxide at the same time as the step of applying the voltage.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.