Processing method and apparatus for ultrafast laser deposition of multilayer film including diamond-like carbon film, anti-reflection film and anti-fingerprint film
US12312676B2 · kind B2 · utility
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Key dates
| Filing date | Jul 17, 2023 |
| Grant date | May 27, 2025 |
| Priority date | — |
| Expiry date | Jul 29, 2043 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2218/31
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A processing method and apparatus for ultrafast laser deposition of a multilayer film including a diamond-like carbon film, an anti-reflection film and an anti-fingerprint film includes: generating primary plasma by first excitement on a target material with a femtosecond or picosecond pulsed laser beam as a pre-pulse; and generating secondary plasma by second excitement on the target material under plasma grating, formed by allowing two femtosecond pulsed laser beams to intersect at a small include angle for interaction in the primary plasma, for deposition to coat a film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.