Coated underlayer for overcoated photoresist
US12313971B2 · kind B2 · utility
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16Claims
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Key dates
| Filing date | Jul 6, 2021 |
| Grant date | May 27, 2025 |
| Priority date | — |
| Expiry date | Mar 23, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/091
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of forming a pattern, the method comprising applying a layer of a coating composition over a substrate; curing the applied coating composition to form a coated underlayer; and forming a photoresist layer over the coated underlayer, wherein the coating composition comprises a first material comprising two or more hydroxy groups; a second material comprising two or more glycidyl groups; an additive comprising a protected amino group; and a solvent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.