Patent · US Active

Optical assembly, projection exposure apparatus and method

US12313978B2 · kind B2 · utility

0Cited by

1References

23Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Andreas Raba · Niederschönenfeld, DE
Johannes Lippert · Buch am Wald, DE
Markus Raab · Stilzendorf, DE

Key dates

Filing date	Aug 10, 2022
Grant date	May 27, 2025
Priority date	—
Expiry date	Apr 19, 2043

Classification

Technology area (CPC G)Physics
CPC primaryG02B5/09
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An optical assembly of a projection exposure apparatus for semiconductor lithography comprises an optical element and an actuator for deforming the optical element. The actuator is subjected to a bias voltage by a controller that is present. A projection exposure apparatus for semiconductor lithography comprises an optical assembly. A method for operating an actuator for deforming an optical element for semiconductor lithography comprises subjecting the actuator to a bias voltage by a controller.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.