Display panel and method of manufacturing the same
US12317591B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | May 29, 2019 |
| Grant date | May 27, 2025 |
| Priority date | — |
| Expiry date | Apr 29, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D99/00
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A display panel and a manufacturing method are provided. The display panel includes a substrate, a source/drain layer, a light shielding layer, a dielectric layer disposed on the substrate and covering the light shielding layer and the source/drain layer, and an oxide semiconductor layer disposed on the dielectric layer. The oxide semiconductor layer is connected to the source/drain layer and the light shielding layer through a first hole and a second hole, respectively. A metal layer is etched to form the source/drain layer and the light shielding layer simultaneously. The dielectric layer arranged on the substrate covers the light shielding layer and the source/drain layer. The dielectric layer functions as an isolating layer, which reduces the number of oxide TFT layers of the display panel, simplifying the film structure of the display panel, reducing the processes and masks required for production, thereby increasing production efficiency and reducing production costs.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.