Interferential patterns for alignment calibration of printheads
US12319056B2 · kind B2 · utility
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15Claims
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Key dates
| Filing date | Mar 8, 2023 |
| Grant date | Jun 3, 2025 |
| Priority date | — |
| Expiry date | Sep 21, 2043 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB41J11/008
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
An interferential pattern is printed to a print media using an upper row die. A first portion of an additional interferential pattern is printed to a print media using a lower row die. A second portion of the additional interferential pattern is printed to the print media using the upper row die. An alignment error between the upper row die and the lower row die is determined based on interferential pattern and the additional interferential pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.