Thin film characteristic measuring apparatus
US12320629B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 1, 2020 |
| Grant date | Jun 3, 2025 |
| Priority date | — |
| Expiry date | Jan 13, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B27/30
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Disclosed is a thin film characteristic measuring apparatus, which is used for measuring the thickness or width of a thin film of an object to be examined. The thin film characteristic measuring apparatus comprises a light source, a first reflecting mirror, a first actuator and a lens assembly. The lens assembly is formed so that the angle formed by an optical axis and a chief ray of the rays transmitted through the lens assembly is less than or equal to the angle formed by the optical axis and a chief ray of the rays incident to the lens assembly. The light source can comprise superluminescent diodes (SLD). Provided is the thin film characteristic measuring apparatus, which enables the light transmitted through the lens assembly to reciprocate on an incident surface of the object to be examined while the first reflecting mirror repeatedly tilts within a predetermined angle range, and thus can accurately measure a relatively large area and can variously control a position to be measured, a method and the like.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.