Patent · US Active

System and method for inspection of multiple features of patterned objects in the manufacture of electrical circuits

US12320758B2 · kind B2 · utility

0Cited by

11References

21Claims

0Family size

Assignee

Orbotech Ltd. · IL

Inventors

Vered Gatt · Nes Ziona, IL
Itzhak Saki Hakim · Palo Alto, US
Chay Goldenberg · Tel Aviv-Yafo, IL
Mordehay Amirim · Tkuma, IL

Key dates

Filing date	Dec 29, 2020
Grant date	Jun 3, 2025
Priority date	—
Expiry date	Apr 30, 2041

Classification

Technology area (CPC G)Physics
CPC primaryG01N2201/127
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A method for inspection of multiple features of patterned objects in the manufacture of electrical circuits, the method including performing defect detection on the patterned object, employing an optical defect detection machine (ODDM) and employing the ODDM to measure at least one of spatial coordinates and physical attributes of at least some of the multiple features.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.