Conductive photo-curable compositions for additive manufacturing
US12325182B2 · kind B2 · utility
0Cited by
34References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 1, 2021 |
| Grant date | Jun 10, 2025 |
| Priority date | — |
| Expiry date | Nov 4, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/038
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
A photo-curable composition for use in additive manufacturing, said composition comprising: a) at least one photocurable monomer or oligomer; b) a photoinitiator for polymerization of the monomer; and, from 0.01 to 1 wt. %, based on the weight of the composition, of c) CNS-derived materials. Following polymerization, the resulting polymerized composition has a volume resistivity no greater than 105 ohm·cm.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.