Enhanced dual-pass and multi-pass particle detection
US12326393B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 19, 2023 |
| Grant date | Jun 10, 2025 |
| Priority date | — |
| Expiry date | Aug 31, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2015/1497
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A particle detection system may include a light source, a first beam splitter, a particle interrogation zone, a reflecting surface, a second beam splitter, a first photodetector, and a second photodetector. The first beam splitter may be configured to split the source beam into an interrogation beam and a reference beam. The particle interrogation zone may be disposed in the path of the interrogation beam. The reflecting surface may be configured to reflect the interrogation beam back on itself. The second beam splitter may be configured to: (i) receive the reference beam and side scattered light from one or more particles interacting with the interrogation beam in the particle interrogation zone; and (ii) produce a first component beam and second component beam. The first photodetector may be configured to detect the first component beam. The second photodetector may be configured to detect the second component beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.