In-situ apparatus for detecting abnormality in process tube
US12326397B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 30, 2021 |
| Grant date | Jun 10, 2025 |
| Priority date | — |
| Expiry date | Aug 30, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/054
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A process tube device can detect the presence of any external materials that may reside within a fluid flowing in the tube. The process tube device detects the external materials in-situ which obviates the need for a separate inspection device to inspect the surface of a wafer after applying fluid on the surface of the wafer. The process tube device utilizes at least two methods of detecting the presence of external materials. The first is the direct measurement method in which a light detecting sensor is used. The second is the indirect measurement method in which a sensor utilizing the principles of Doppler shift is used. Here, contrary to the first method that at least partially used reflected or refracted light, the second method uses a Doppler shift sensor to detect the presence of the external material by measuring the velocity of the fluid flowing in the tube.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.