Dose mapper method
US12326664B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jun 24, 2022 |
| Grant date | Jun 10, 2025 |
| Priority date | — |
| Expiry date | Jan 5, 2044 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70558
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present application discloses a dose mapper method, which includes: step 1: collecting critical dimension fingerprint of each tool and each mask and storing the critical dimension fingerprint in a database; step 2: before exposing a wafer, pre-selecting the tool and the mask to be used, selecting the corresponding critical dimension fingerprint from the database and combining the corresponding critical dimension fingerprint to form total critical dimension fingerprint; step 3: obtaining dose mapper data for exposure of the wafer according to the total critical dimension fingerprint; step 4: exposing the wafer, and correcting the exposure of the wafer according to the dose mapper data in an exposure process. The present application can quickly and easily generate a dose mapper data file, especially when there is a new tool or mask to be expanded, thus improving the efficiency of generating the dose mapper data file and improving the production capacity.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.