Offset pore poromeric polishing pad
US12330261B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 18, 2020 |
| Grant date | Jun 17, 2025 |
| Priority date | — |
| Expiry date | Jun 14, 2041 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB24D11/00
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
The invention provides a porous polyurethane polishing pad that includes a porous matrix having large pores that extend upward from a base surface and open to an upper surface. The large pores extend to the top polishing surface and have lower and upper sections with a vertical orientation. The lower and upper sections are offset in a horizontal direction. Middle-sized pores with a columnar shape and a vertical orientation originate adjacent the middle sections and small pores with a columnar shape and a vertical orientation originate between the middle-sized pores. The pores combine for increasing compressibility of the polishing pad and contact area of the top polishing surface during polishing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.