Integrated photonic responsive material sensor
US12339338B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 7, 2023 |
| Grant date | Jun 24, 2025 |
| Priority date | — |
| Expiry date | Apr 21, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01R33/26
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Systems for an integrated photonic responsive material sensor are described herein. In certain embodiments, a system includes a carrier wafer that includes a cavity formed in the carrier wafer. The carrier wafer also includes a responsive waveguide coupled to the cavity, the responsive waveguide formed from responsive material responsive to a force by shifting a resonance frequency of point defects in the responsive material in response to the force, wherein a pump light is directed to the responsive waveguide to prepare the responsive waveguide to absorb a probe light when exposed to a radio frequency at the point defect resonance frequency. Additionally, the system includes components coupled to the carrier wafer, wherein the components include a probe light source that generates the probe light, wherein the components are positioned in relation to the carrier wafer to couple the probe light into the cavity.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.