Apparatus match detection method, detection system, prewarning method, and prewarning system
US12341070B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Mar 1, 2021 |
| Grant date | Jun 24, 2025 |
| Priority date | — |
| Expiry date | Oct 10, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2826
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Embodiments of the present disclosure provide an apparatus match detection method, a detection system, a prewarning method and a prewarning system, the apparatus match detection method includes: providing a to-be-detected wafer, a first detection apparatus, and a second detection apparatus; measuring by the first detection apparatus a critical dimension of the first detection area to acquire a first detection result; measuring by the second detection apparatus a critical dimension of the third detection area to acquire a third detection result; measuring by the first detection apparatus a critical dimension of the second detection area to acquire a second detection result; acquiring a measurement difference between the first detection apparatus and the second detection apparatus based on the first detection result, the second detection result, and the third detection result; and acquiring a degree of deviation between the second detection apparatus and the first detection apparatus based on the measurement difference.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.