Patent · US Active

Injection device for discharging a gas, process gas system for supplying a process gas, and device and method for the thermal or thermo-chemical treatment of material

US12343717B2 · kind B2 · utility

0Cited by
7References
25Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 18, 2019
Grant dateJul 1, 2025
Priority date
Expiry dateMay 19, 2041

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02E60/10
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

Injection device (56) for discharging a gas (54), in particular a process gas (54), onto a material (12), in particular onto a battery cathode material (14) that is to be calcined, having at least one inlet (58) through which the gas (54) can be supplied to the injection device (56), and at least one outlet (60) through which the gas (54) can be discharged from the injection device (56), the inlet and outlet being connected to one another by a flow path (62) for the gas (54). According to the invention, the flow path (62) has a heat exchanger (64) with a heat exchanger housing (68) which is accessible from the outside for an ambient atmosphere (66) and in which a duct arrangement (70) is integrated. The duct arrangement (70) comprises a first flow duct (72.1) and a second flow duct (72.2) between which there is formed a redirection region (74.1) such that the gas (54) can flow through the first and second flow duct (72.1, 72.2) in different main flow directions. The invention further relates to a process gas system (52) for supplying a gas (54) and to a device (10) and a method for the thermal or thermo-chemical treatment of material.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.