Optical measurement apparatus, measuring method using the same, and method of fabricating semiconductor device using the same
US12345521B2 · kind B2 · utility
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7References
20Claims
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Key dates
| Filing date | Jan 27, 2022 |
| Grant date | Jul 1, 2025 |
| Priority date | — |
| Expiry date | Oct 16, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/12
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An optical measurement apparatus includes a light source unit generating and outputting light, a polarized light generating unit generating polarized light from the light, an optical system generating a pupil image of a measurement target, using the polarized light, a self-interference generating unit generating multiple beams that are split from the pupil image, and a detecting unit detecting a self-interference image generated by interference of the multiple beams with each other.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.