Patent · US Active

Process and system for monitoring at least one concentration of a gas in a monitored area

US12345690B2 · kind B2 · utility

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18Claims
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Assignee

Inventors

Key dates

Filing dateFeb 25, 2022
Grant dateJul 1, 2025
Priority date
Expiry dateOct 2, 2042

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01N2001/021
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A process and a system for monitoring at least one concentration of a gas in a monitored area includes generating data by a mobile gas measuring device (3a), whose position in the monitored area is determined or is known and transmitting the data directly or indirectly to a central data processing unit (1). The data are compared with at least one limit value, and an information signal is outputted by the at least one mobile gas measuring device and/or by the central data processing unit in case of an undershooting or overshooting of the limit value. The monitored area is divided into at least two zones (8) and zone-specific parameters are assigned to the zones. A functionality of the mobile gas measuring device is set and/or changed based on the current position of the gas measuring device and based on at least one of the zone-specific parameters.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.