Display substrate and manufacturing method thereof, and display apparatus

US12349540B2 · kind B2 · utility

Assignees

• MIANYANG BOE OPTOELECTRONICS TECHNOLOGY CO., LTD. · CN
• BOE Technology Group Co., Ltd. · CN

Inventors

• Xin Cao · Shanghai, CN
• Yawei Zhu · Beijing, CN
• Heungsik Kim · Beijing, CN
• Zifeng Wang · Kowloon, CN
• Haoyuan FAN · Beijing, CN

Key dates

• Filing date: Nov 20, 2020
• Grant date: Jul 1, 2025
• Expiry date: Jun 24, 2042

Classification

• Technology area (CPC H): Electricity
• CPC primary: H10K59/8792

Abstract

The present disclosure provides a display substrate, a manufacturing method thereof and a display apparatus. The display substrate includes a base substrate, an active structure layer disposed on the base substrate and a source-drain structure layer disposed on the active structure layer. The active structure layer includes a first active layer and a second active layer. A material of the first active layer includes low-temperature polysilicon and a material of the second active layer includes oxide semiconductors. The source-drain structure layer includes a first source-drain electrode and a second source-drain electrode, wherein the first source-drain electrode overlaps with a first side surface of the first active layer through a first via hole and the second source-drain electrode overlaps with a second side surface of the second active layer through a second via hole.