Silica particle and method for producing the same
US12351467B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 21, 2023 |
| Grant date | Jul 8, 2025 |
| Priority date | — |
| Expiry date | Nov 21, 2043 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01P2006/17
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A silica particle includes: a quaternary ammonium salt, in which the following expressions are satisfied, 0.90≤FBEFORE/FAFTER≤1.10, and 5≤FSINTERING/FBEFORE≤20, in which FBEFORE represents a maximum frequency value of a pore diameter of 2 nm or less in the silica particles before washing, which is obtained from a pore distribution curve in a nitrogen gas adsorption method, FAFTER represents a maximum frequency value of the pore diameter of 2 nm or less in the silica particles after washing, which is obtained from the pore distribution curve in the nitrogen gas adsorption method, and FSINTERING represents a maximum frequency value of the pore diameter of 2 nm or less in the silica particles before washing and after sintering at 600° C., which is obtained from the pore distribution curve in the nitrogen gas adsorption method.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.