Porous inlet
US12351915B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 6, 2019 |
| Grant date | Jul 8, 2025 |
| Priority date | — |
| Expiry date | Feb 17, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67017
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A substrate processing apparatus including a reaction chamber with an inlet opening, an in-feed line to provide a reactive chemical into the reaction chamber via the inlet opening, incoming gas flow control means in the in-feed line, the in-feed line extending from the flow control means to the reaction chamber, the in-feed line in this portion between the flow control means and the reaction chamber having the form of an inlet pipe with a gas-permeable wall, the inlet pipe with the gas-permeable wall extending towards the inlet opening through a volume at least partly surrounding the inlet pipe, and the apparatus (100, 800) being configured to provide fluid to surround and enter the inlet pipe in said portion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.