Patent · US Active

Field facet system and lithography apparatus

US12353137B2 · kind B2 · utility

0Cited by

0References

20Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Arno Schmittner · Oberkochen, DE
Willi Anderl · Wertingen, DE
Stefan Lippoldt · Aalen, DE
Joram Rosseels · Putte, BE
Rob Janssen · Meerssen, NL

Key dates

Filing date	May 16, 2023
Grant date	Jul 8, 2025
Priority date	—
Expiry date	Jan 10, 2044

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/7015
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A field facet system for a lithography apparatus comprises: an optical element which comprises an elastically deformable facet portion having a light-reflecting optically active surface; and at least one actuating element for introducing a bending moment into the facet portion to deform the facet portion to change a radius of curvature of the optically active surface. The facet portion is curved in an arched manner in a plan view of the optically active surface. The rigidity of the facet portion as viewed along a longitudinal direction of the facet portion is variable so that a normal vector oriented perpendicularly to the optically active surface tilts exclusively about a spatial direction when the bending moment is introduced into the facet portion.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.