High resolution two-dimensional resistance tomography
US12357188B2 · kind B2 · utility
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Key dates
| Filing date | Nov 29, 2019 |
| Grant date | Jul 15, 2025 |
| Priority date | — |
| Expiry date | May 28, 2042 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61B5/0073
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
The disclosed 2-D and 3-D tomographic resistance imaging method improves tomographic resistance image resolution by adopting an orthogonal basis with the maximum number of elements N to describe the maximum resolution resistivity map ρ(r), where this number of elements N is set according to the number of electrodes Q; by defining the orthogonal basis according to any known constraints in the problem, thereby enhancing the resolution where it is needed; by positioning electrodes to be sensitive to these basis functions; and by choosing current I and voltage V contact electrode pairs that maximize signal-to-noise ratio.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.