Modular sputtering target with precious metal insert and skirt
US12359303B2 · kind B2 · utility
0Cited by
4References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 24, 2022 |
| Grant date | Jul 15, 2025 |
| Priority date | — |
| Expiry date | Sep 24, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3435
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A sputtering target comprising a target insert comprising a target metal compound and a skirt structure including a primary skirt and a secondary skirt. The primary skirt is disposed adjacent least a portion of a secondary skirt and comprises a first metal compound. The secondary skirt comprises a second metal compound that is different from the first metal compound.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.