Apparatus, method and system for measuring locations on an object
US12359914B2 · kind B2 · utility
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3References
27Claims
0Family size
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Key dates
| Filing date | Feb 18, 2021 |
| Grant date | Jul 15, 2025 |
| Priority date | — |
| Expiry date | Dec 18, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01C15/04
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A system for monitoring survey reflectors arranged at a plurality of locations on an object, having: The processing unit is configured to determine locations of the survey reflectors from the image sensor data and detect movement of the survey reflectors based on a comparison of the determined locations with previously determined locations.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.