Stabilized interfaces of inorganic radiation patterning compositions on substrates
US12360454B2 · kind B2 · utility
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23Claims
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Key dates
| Filing date | Jul 10, 2020 |
| Grant date | Jul 15, 2025 |
| Priority date | — |
| Expiry date | Apr 18, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/322
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method is described for stabilizing organometallic coating interfaces through the use of multilayer structures that incorporate an underlayer coating. The underlayer is composed of an organic polymer that has crosslinking and adhesion-promoting functional groups. The underlayer composition may include photoacid generators. Multilayer structures for patterning are described based on organometallic radiation sensitive patterning compositions, such as alkyl tin oxo hydroxo compositions, which are placed over a polymer underlayer.
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