Patent · US Active

Diaphragm assembly for delimiting the coating region of a sputter source, and sputtering device

US12365978B2 · kind B2 · utility

0Cited by

3References

18Claims

0Family size

Assignee

Solayer GmbH · DE

Inventors

Dzmitry Hrunski · Aschaffenburg, DE
Markus Kress · Mühlheim am Main, DE
Marco Seibert · Langen, DE
Florian Schwarz · Fürth, DE

Key dates

Filing date	Dec 6, 2021
Grant date	Jul 22, 2025
Priority date	—
Expiry date	Dec 6, 2041

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/34
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

The invention relates to a diaphragm assembly of an aperture diaphragm for delimiting the coating region which is operative in the deposition of a layer and to a sputtering device which uses the diaphragm assembly. The diaphragm assembly comprises a main part (13) which has a passage (14) delimited by a passage edge. The aim of the invention is to design the diaphragm opening to be temporally and geometrically variable in situ. This is achieved in that the diaphragm assembly has at least one diaphragm plate (17, 17′, 17″) which is assembled on the main part (13) so as to be movable in front of the passage (14) and back. The diaphragm assembly additionally comprises a movement device which is operatively connected to the diaphragm plate (17, 17′, 17″) in order to carry out the movement thereof.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.