Wavefront sensors with irregular aperture masks, diffusers, and cameras, and methods of making and using the same
US12366483B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 5, 2024 |
| Grant date | Jul 22, 2025 |
| Priority date | — |
| Expiry date | Nov 5, 2044 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T7/80
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A wavefront sensor for measuring a wavefront that includes an aperture mask configured to receive incident light, the aperture mask comprising a plurality of apertures irregularly spaced and arranged in a plurality of sub-windows that respectively transmit sub-beams of the incident light. A diffuser can receive the sub-beams transmitted by the plurality of apertures. A controller of the sensor is configured to identify measured sub-beams by convolving the sub-beams imaged on the diffuser with a map of the plurality of apertures; and measure the wavefront of the incident light based on changes in position of the sub-beams in a digital image of the diffuser relative to both reference positions and neighboring sub-beams.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.