Method and apparatus for processing chip based on deep learning
US12370628B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Nov 17, 2021 |
| Grant date | Jul 29, 2025 |
| Priority date | — |
| Expiry date | May 30, 2044 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A method for processing a chip based on deep learning and an apparatus for processing a chip based on deep learning are provided. The method includes scanning the chip with femtosecond laser in a predetermined polarization state to produce a main scanning trajectory and periodic nano-stripes on both sides of the main scanning trajectory, so as to form a nano-ridge structure on a surface of the chip; obtaining a super-resolution microscopic image of the nano-ridge structure by super-resolution microscopy; obtaining a target image; reconstructing the target image based on deep learning for image super-resolution to obtain the reconstructed image, and recognizing and processing the reconstructed image to obtain characteristic parameters of the nano-ridge structure as input parameters for deep learning for femtosecond laser processing; adjusting processing parameters of the chip according to the output values of the deep learning model for femtosecond laser processing; and outputting the optimized nano-ridge structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.