Patent · US Active

Acidic treatment liquid processing apparatus, acidic treatment liquid processing method, surface treatment system, and surface treatment method

US12371799B2 · kind B2 · utility

0Cited by

9References

8Claims

0Family size

Assignee

Mitsubishi Electric Corporation · JP

Inventors

Koji Imasaka · Tokyo, JP
Hiroaki MIKAWA · Tokyo, JP
Kohei KAWASAKI · Tokyo, JP
Mitsuhiro ISHIGAKI · Tokyo, JP
Masahiko Nagai · Nagoya, JP
Hidehiko Tajima · Tokyo, JP
Ayako Ureshino · Tokyo, JP
Kaoru Egawa · Tokyo, JP
Akihiro Sakanishi · Nagasaki, JP
Taisuke MIYAZAKI · Tokyo, JP

Key dates

Filing date	Aug 26, 2019
Grant date	Jul 29, 2025
Priority date	—
Expiry date	May 14, 2042

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC02F1/4693
WIPO fieldChemical engineering
WIPO sectorChemistry

Abstract

An acidic treatment liquid processing apparatus includes: a tank having an interior space; a diaphragm permeable to a metal cation and separating the interior space of the tank into a first chamber and a second chamber; a first electrode disposed in the first chamber; a second electrode disposed in the second chamber; a power supply configured to apply a voltage while using the first electrode as an anode and the second electrode as a cathode; a first liquid passing part configured to pass an acidic treatment liquid containing a dichromate ion and a metal cation into the first chamber; and a second liquid passing part configured to pass an acid aqueous solution into the second chamber.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.