Patent · US Active

Optimized infrared light source for a gas sensor, and manufacturing method thereof

US12372457B2 · kind B2 · utility

0Cited by
3References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 7, 2021
Grant dateJul 29, 2025
Priority date
Expiry dateJan 11, 2042

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01N2201/06186
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

An infrared light source includes an emitting element extending as a radial plane about the emitting element's center and configured to heat up to emit infrared light. The emitting element lies in a cavity bounded by a cover, placed facing the emitting element. The cover has internal and external faces, the internal face facing the emitting element, and the external face defining an interface between the cover and a medium outside the light source. The cover occupies, parallel to a transverse axis perpendicular to the radial plane, a thickness, between the internal and external faces. The external face includes a planar central portion and at least one peripheral portion adjacent and inclined respective to the central portion. The planar central portion extends about the external face's center. In the peripheral portion, the cover's thickness decreases as a function of a distance from the central portion.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.