Patent · US Active

High precision VPD-DC scan

US12379327B2 · kind B2 · utility

0Cited by

1References

20Claims

0Family size

Assignee

PVA TEPLA AG · DE

Inventors

Robert Beikler · Wettenberg, DE
William Mande · Wettenberg, DE
Walter Boehme · Wettenberg, DE

Key dates

Filing date	Sep 9, 2022
Grant date	Aug 5, 2025
Priority date	—
Expiry date	Apr 2, 2044

Classification

Technology area (CPC G)Physics
CPC primaryG01N2021/9511
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

The invention relates to a method and system for performing VPD-DC on wafer surfaces, wherein the pipette substitutes for the function of the scan tube and is operated such that a bulge of scanning liquid protrudes from the pipette channel and contacts the wafer surface for scanning.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.