Apparatus for treating nail plate or skin using plasma
US12383643B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 28, 2025 |
| Grant date | Aug 12, 2025 |
| Priority date | — |
| Expiry date | Mar 28, 2045 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61L2202/16
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
An apparatus for treating a nail plate or a skin using plasma is provided. The apparatus comprises a plasma generation assembly, a power supply, and a grounding electrode. The plasma generation assembly comprises a positive electrode module and a curved surface dielectric layer. The positive electrode module includes a discharging face. The curved surface dielectric layer includes a first surface and a second surface opposite to the first surface, wherein the first surface is adjacent to the discharging face, and clearances outside the second surface or holes from the first surface to the second surface are used for high frequency plasma generation. The clearances form a closed room. The power supply powers the plasma generation assembly so as to generate a current from the discharging face to the grounding electrode.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.