Patent · US Active

Method of manufacturing reference sample, method of measuring droplet, and apparatus for measuring droplet

US12385812B2 · kind B2 · utility

0Cited by
0References
20Claims
0Family size

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Key dates

Filing dateJun 16, 2022
Grant dateAug 12, 2025
Priority date
Expiry dateJun 2, 2043

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG06T2207/30241
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A method of manufacturing a reference sample includes discharging a droplet, obtaining a plurality of captured images by capturing the droplet according to a predetermined period with respect to an imaginary plane defined on a falling path of a discharged droplet, analyzing the plurality of captured images, and marking a point corresponding to the falling path of the droplet on a sample substrate based on a result of analyzing the plurality of captured images.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.