Electron ptychography method and apparatus for automatically correcting mistilt of zone axis of sample
US12385859B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 11, 2023 |
| Grant date | Aug 12, 2025 |
| Priority date | — |
| Expiry date | Mar 28, 2044 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N23/2055
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An electron ptychography method and an electron ptychography apparatus for automatically correcting a mistilt of a zone axis of a sample. The method includes: acquiring a diffraction pattern of each scan point of the sample by scanning the sample through using an electron beam; initializing an object function and an electron beam function, constructing a forward propagation model according to a propagation function between sample slices, and calculating a loss function to be a difference between a calculated diffraction pattern and the acquired diffraction pattern, where the calculated diffraction pattern is obtained from the forward propagation model and parameters to be optimized; calculating gradients of the loss function with respect to parameters to be optimized respectively, and optimizing the parameters to be optimized according to the gradients; executing the calculating the loss function of the forward propagation model, the calculating the gradients of the loss function with respect to the parameters to be optimized respectively, and the optimizing the parameters to be optimized according to the gradients, iteratively, till a termination condition for iterations is satisf…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.