Patent · US Active

Reflective optical element, illumination optical unit, projection exposure apparatus, and method for producing a protective layer

US12386263B2 · kind B2 · utility

0Cited by

2References

20Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Sandro Hoffmann · Aalen, DE
Valentin Jonatan Bolsinger · Aalen, DE
Sandra Haschke · Oberkochen, DE

Key dates

Filing date	Feb 20, 2023
Grant date	Aug 12, 2025
Priority date	—
Expiry date	Jul 25, 2043

Classification

Technology area (CPC G)Physics
CPC primaryG21K2201/067
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A reflective optical element (17), in particular for an illumination optical unit of a projection exposure apparatus includes: a structured surface (25a) that preferably forms a grating structure (29), and a reflective coating (36) that is applied to the structured surface (25a). The reflective coating (36) covers the structured surface (25a) discontinuously, and the reflective optical element (17) has at least one protective layer (37) that covers the structured surface (25a) continuously. Also disclosed are an illumination optical unit (4) for a projection exposure apparatus (1) including at least one reflective optical element (17) of this type, to a projection exposure apparatus (1) including an illumination optical unit (4) of this type, and to a method for producing a protective layer (37) on a reflective optical element (17) of this type.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.