Dynamic vacuum seal system for physical vapor deposition sputter applications
US12387913B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 8, 2025 |
| Grant date | Aug 12, 2025 |
| Priority date | — |
| Expiry date | Jan 8, 2045 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3441
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Provided is a vacuum seal and seal system including a corresponding isolation ring and a corresponding sputtering target. The seal and seal system may be used in PVD sputter applications. The seal may include a compressible portion and a rigid portion. The compressible portion may include two or more higher profile protrusions and two or more lower profile recesses that facilitate formation of a vacuum seal through compression by and between the isolation ring and the sputtering target. The seal may further include a removable and replaceable plasma shield that is attachable to a first end of the seal. The seal may further include a rim on a second end that selectively couples with a corresponding step-out portion of the isolation ring. The sputtering target may have a continuous peripheral flange surface. In an embodiment, the seal and seal system is self-centering.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.