Transport device having local purge function
US12387959B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 29, 2018 |
| Grant date | Aug 12, 2025 |
| Priority date | — |
| Expiry date | Oct 6, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/68707
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The purpose of the present invention is to provide, at low cost, a transport apparatus 2 which is capable of transporting a semiconductor wafer W between a FOUP 19 and a processing apparatus 3 without exposing a surface to be processed of the semiconductor wafer to an oxidizing atmosphere. This transport apparatus 2 includes a load port 20 that has atmosphere replacing function, a transport robot 2 that has an atmosphere replacing function, an aligner 40 that has an atmosphere replacing function, and a load lock chamber 12 that has an atmosphere replacing function. The surface being processed of the semiconductor wafer has the atmosphere replaced locally while the semiconductor wafer is being moved and is being subjected to processes such as positioning.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.