Patent · US Active

System for controlled depositing of a fluid on a substrate

US12390994B2 · kind B2 · utility

0Cited by
0References
16Claims
0Family size

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Key dates

Filing dateDec 17, 2019
Grant dateAug 19, 2025
Priority date
Expiry dateNov 11, 2041

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB33Y50/02
  • WIPO fieldOther special machines
  • WIPO sectorMechanical engineering

Abstract

The present invention relates to a system for controlled deposition of a fluid on a substrate and also to a method employing the system. The system comprises:

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.