System for controlled depositing of a fluid on a substrate
US12390994B2 · kind B2 · utility
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16Claims
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Key dates
| Filing date | Dec 17, 2019 |
| Grant date | Aug 19, 2025 |
| Priority date | — |
| Expiry date | Nov 11, 2041 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB33Y50/02
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
The present invention relates to a system for controlled deposition of a fluid on a substrate and also to a method employing the system. The system comprises:
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.