Process for removing an impurity from a chlorosilane mixture

US12391559B2 · kind B2 · utility

Assignee

• Wacker Chemie AG · DE

Inventors

• Jens Felix Knoth · Munich, DE
• Uwe Pätzold · Burghausen, DE

Key dates

• Filing date: Nov 5, 2020
• Grant date: Aug 19, 2025
• Expiry date: Jul 5, 2042

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C07F7/20
• WIPO field: Organic fine chemistry
• WIPO sector: Chemistry

Abstract

A process for removing an impurity from a mixture containing at least one chlorosilane and/or organochlorosilane and at least one impurity from the group comprising a boron compound, a phosphorus compound, and an arsenic compound is provided. The process includes contacting the liquid mixture with an unfunctionalized organic polymer having pores with an average pore diameter of less than 50 Å, the average pore diameter being determined in accordance with DIN ISO 66134, and optionally removing the unfunctionalized organic polymer.