Patent · US Active

Dielectric substrate and method of forming the same

US12391850B2 · kind B2 · utility

0Cited by
45References
17Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 9, 2021
Grant dateAug 19, 2025
Priority date
Expiry dateDec 9, 2041

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH05K2201/068
  • WIPO fieldAudio-visual technology
  • WIPO sectorElectrical engineering

Abstract

The present disclosure relates to a dielectric substrate that may include a first fluoropolymer based adhesive layer, a polyimide layer overlying the fluoropolymer based adhesive layer, and a first filled polymer layer overlying the polyimide layer. The first filled polymer layer may include a resin matrix component, and a first ceramic filler component. The first ceramic filler component may include a first filler material. The first filler material may further have a mean particle size of at not greater than about 10 microns.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.