Powder atomic layer deposition equipment and gas supply method therefor
US12392035B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 13, 2021 |
| Grant date | Aug 19, 2025 |
| Priority date | — |
| Expiry date | Oct 31, 2041 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/52
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Provided are powder atomic layer deposition (ALD) equipment capable of increasing deposition uniformity of powder by using a gas supply sequence with or without an impeller or a vibration generator, and a gas supply method thereof, the powder ALD equipment including a process chamber having an accommodation space therein to accommodate powder, a gas supplier for sequentially supplying a plurality of gases to the powder, and a gas exhauster for exhausting, to outside, the gases discharged from the process chamber, wherein the gas supplier includes a gas supply plate, a first gas supply line, a first valve, edge valves, and a gas supply sequence controller.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.